I.S. EN 62047-16:2015現行
Semiconductor Devices - Micro-electromechanical Devices Part 16: Test Methods for Determining Residual Stresses of Mems Films - Wafer Curvature and Cantilever Beam Deflection Methods
出版：National Standards Authority of Ireland
專家解讀視頻
基本信息
標準編號： I.S. EN 62047-16:2015
發布時間：2015/7/28 0:00:00
標準類別：Standard
出版單位：National Standards Authority of Ireland
標準頁數：34
標準簡介
Defines the test methods to measure the residual stresses of films with thickness in the range of 0,01 [mu]m to 10 [mu]m in MEMS structures fabricated by wafer curvature or cantilever beam deflection methods.
等同采用的國際標準
EN 62047-16:2015 - Identical
