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IEC 62047-26 Ed. 1.0現(xiàn)行

Semiconductor devices - Micro-electromechanical devices Part 26: Description and measurement methods for micro trench and needle structures

出版:International Electrotechnical Committee

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基本信息
標準編號: IEC 62047-26 Ed. 1.0
發(fā)布時間:2016/1/7 0:00:00
標準類別:Standard
出版單位:International Electrotechnical Committee
標準頁數(shù):57
標準簡介

IEC 62047-26:2016 specifies descriptions of trench structure and needle structure in a micrometer scale. In addition, it provides examples of measurement for the geometry of both structures. For trench structures, this standard applies to structures with a depth of 1 μm to 100 μm; walls and trenches with respective widths of 5 μm to 150 μm; and aspect ratio of 0,006 7 to 20. For needle structures, the standard applies to structures with three or four faces with a height, horizontal width and vertical width of 2 μm or larger, and with dimensions that fit inside a cube with sides of 100 μm. This standard is applicable to the structural design of MEMS and geometrical evaluation after MEMS processes.