SEMI MF1771:2016(R2021)現行
Test Method for Evaluating Gate Oxide Integrity by Voltage Ramp Technique
出版：Semiconductor Equipment & Materials Institute
專家解讀視頻
基本信息
標準編號： SEMI MF1771:2016(R2021)
標準類別：Test Method
出版單位：Semiconductor Equipment & Materials Institute
標準頁數：0
標準簡介
The technique outlined in this Test Method is meant to standardize the procedure, analysis and reporting of oxide integrity data via the voltage ramp technique among interested parties.
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